KMPR® 1000 i-Line photoresist is a high contrast, epoxy-based photoresist that can be developed in a conventional aqueous alkaline developer (TMAH) and more easily removed after normal processing. KMPR® is designed to coat 4–110 μm in a single step using the five standard viscosities. KMPR® 1000 has excellent adhesion, chemical and plasma resistance, making it ideal for many MEMS, Electrolytic Plating and DRIE applications.